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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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Gijbels, R.; Bogaerts, A. |
Recent trends in solids mass spectrometry, with special emphasis on glow discharge mass spectrometry |
1996 |
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UA library record |
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Bogaerts, A.; Gijbels, R. |
Relative sensitivity factors in glow discharge mass spectrometry: the role of charge transfer ionization |
1996 |
Journal of analytical atomic spectrometry |
11 |
38 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, R.; de Keyser, A.; Herlach, F.; Peeters, F.M.; DeRosa, F.; Palmstrøm, C.J.; Brehmer, D.; Allen, S.J. |
Size effects in the transport properties of thin Sc1-xErxAs epitaxial layers buried in GaAs |
1994 |
Solid state electronics |
37 |
4 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Modelling of a direct current glow discharge: combined models for the electrons, argon ions and metastables |
1995 |
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UA library record |
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Bogaerts, A.; Gijbels, R. |
Modeling of metastable argon atoms in a direct current glow discharge |
1995 |
Physical review : A : atomic, molecular and optical physics |
52 |
98 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Aghaei, M. |
What modeling reveals about the properties of an inductively coupled plasma |
2016 |
Spectroscopy |
31 |
|
UA library record; WoS full record |
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Jian-Ping, N.; Xiao-Dan, L.; Cheng-Li, Z.; You-Min, Q.; Ping-Ni, H.; Bogaerts, A.; Fu-Jun, G. |
Molecular dynamics simulation of temperature effects on CF(3)(+) etching of Si surface |
2010 |
Wuli xuebao |
59 |
|
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Comprehensive three-dimensional modeling network for a dc glow discharge plasma |
1998 |
Plasma physics reports |
24 |
8 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R. |
Monte Carlo model for the argon ions and fast argon atoms in a radio-frequency discharge |
1999 |
IEEE transactions on plasma science |
27 |
15 |
UA library record; WoS full record; WoS citing articles |
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Berezhnoi, S.; Kaganovich, I.; Misina, M.; Bogaerts, A.; Gijbels, R. |
Semianalytical description of nonlocal secondary electrons in a radio-frequency capacitively coupled plasma at intermediate pressures |
1999 |
IEEE transactions plasma science |
27 |
7 |
UA library record; WoS full record; WoS citing articles |
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Yan, M.; Bogaerts, A.; Gijbels, R. |
Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge |
2002 |
IEEE transactions on plasma science |
30 |
|
UA library record; WoS full record |
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Herrebout, D.; Bogaerts, A.; Gijbels, R.; Goedheer, W.J.; Vanhulsel, A. |
A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry |
2003 |
IEEE transactions on plasma science |
31 |
26 |
UA library record; WoS full record; WoS citing articles |
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de Bleecker, K.; Bogaerts, A.; Goedheer, W.; Gijbels, R. |
Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model |
2004 |
IEEE transactions on plasma science |
32 |
29 |
UA library record; WoS full record; WoS citing articles |
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Kolev, I.; Bogaerts, A. |
Detailed numerical investigation of a DC sputter magnetron |
2006 |
IEEE transactions on plasma science |
34 |
28 |
UA library record; WoS full record; WoS citing articles |
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Chen, Z.Y.; Bogaerts, A.; Depla, D.; Ignatova, V. |
Dynamic Monte Carlo simulation for reactive sputtering of aluminium |
2003 |
Nuclear instruments and methods in physics research: B |
207 |
20 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Yan, M.; Bogaerts, A.; Gijbels, R. |
PIC-MC simulation of an RF capacitively coupled Ar/H2 discharge |
2003 |
Nuclear instruments and methods in physics research: B |
202 |
8 |
UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Bogaerts, A.; Gijbels, R.; Benedikt, J.; van de Sanden, M.C.M. |
Molecular dynamics simulation of the impact behaviour of various hydrocarbon species on DLC |
2005 |
Nuclear instruments and methods in physics research: B: beam interactions with materials and atoms |
228 |
19 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Chen, Z.; Gijbels, R. |
Glow discharge modelling: from basic understanding towards applications |
2003 |
Surface and interface analysis |
35 |
14 |
UA library record; WoS full record; WoS citing articles |
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Pietanza, L.D.; Guaitella, O.; Aquilanti, V.; Armenise, I.; Bogaerts, A.; Capitelli, M.; Colonna, G.; Guerra, V.; Engeln, R.; Kustova, E.; Lombardi, A.; Palazzetti, F.; Silva, T. |
Advances in non-equilibrium $$\hbox {CO}_2$$ plasma kinetics: a theoretical and experimental review |
2021 |
European Physical Journal D |
75 |
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UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Gijbels, R.; Grozeva, M.; Sabotinov, N. |
Investigation of laser output power saturation in the He-Cu+ IR hollow cathode discharge laser by experiments and numerical modeling |
2003 |
Physica scripta |
T105 |
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UA library record; WoS full record; WoS citing articles |
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Neyts, E.; Eckert, M.; Bogaerts, A. |
Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: influence of the growth species and the Ar+ ion kinetic energy |
2007 |
Chemical vapor deposition |
13 |
14 |
UA library record; WoS full record; WoS citing articles |
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Eckert, M.; Neyts, E.; Bogaerts, A. |
Molecular dynamics simulations of the sticking and etch behavior of various growth species of (ultra)nanocrystalline diamond films |
2008 |
Chemical vapor deposition |
14 |
25 |
UA library record; WoS full record; WoS citing articles |
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Baguer, N.; Neyts, E.; van Gils, S.; Bogaerts, A. |
Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations |
2008 |
Chemical vapor deposition |
14 |
14 |
UA library record; WoS full record; WoS citing articles |
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Bogaerts, A.; Naylor, J.; Hatcher, M.; Jones, W.J.; Mason, R. |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge: modeling and comparison with experiment |
1998 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
16 |
12 |
UA library record; WoS full record; WoS citing articles |
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Depla, D.; Chen, Z.Y.; Bogaerts, A.; Ignatova, V.; de Gryse, R.; Gijbels, R. |
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering |
2004 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
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Liu, Y.-X.; Zhang, Y.-R.; Bogaerts, A.; Wang, Y.-N. |
Electromagnetic effects in high-frequency large-area capacitive discharges : a review |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
10 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the bias effect in inductive/capacitive discharges |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
9 |
UA library record; WoS full record; WoS citing articles |
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Zhang, Y.-R.; Tinck, S.; De Schepper, P.; Wang, Y.-N.; Bogaerts, A. |
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
3 |
UA library record; WoS full record; WoS citing articles |
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