| Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
| Huyskens, C.; De Wever, H.; Fovet, Y.; Wegmann, U.; Diels, L.; Lenaerts, S. |
Screening of novel MBR fouling reducers : benchmarking with known fouling reducers and evaluation of their mechanism of action |
2012 |
Separation and purification technology |
95 |
24 |
UA library record; WoS full record; WoS citing articles |
| Huyskens, C.; Lenaerts, S.; Brauns, E.; Diels, L.; de Wever, H. |
Study of (ir)reversible fouling in MBRs under various operating conditions using new on-line fouling sensor |
2011 |
Separation and purification technology |
81 |
15 |
UA library record; WoS full record; WoS citing articles |
| Blommaerts, N.; Dingenen, F.; Middelkoop, V.; Savelkouls, J.; Goemans, M.; Tytgat, T.; Verbruggen, S.W.; Lenaerts, S. |
Ultrafast screening of commercial sorbent materials for VOC adsorption using real-time FTIR spectroscopy |
2018 |
Separation and purification technology |
207 |
5 |
UA library record; WoS full record; WoS citing articles |
| Helm, M.; Hilber, W.; Fromherz, T.; Peeters, F.M.; Alavi, K.; Pathak, R.N. |
Bloch and localized electrons in semiconductor superlattices |
1994 |
Semiconductor science and technology |
9 |
1 |
UA library record; WoS full record; WoS citing articles |
| Peeters, F.M.; Devreese, J.T. |
Hot magneto-phonon and electro-phonon resonances in heterostructures |
1992 |
Semiconductor science and technology: B |
7 |
12 |
UA library record; WoS full record; WoS citing articles |
| Pereira, J.M.; Peeters, F.M.; Chaves, A.; Farias, G.A. |
Klein tunneling in single and multiple barriers in graphene |
2010 |
Semiconductor science and technology |
25 |
83 |
UA library record; WoS full record; WoS citing articles |
| Kastalsky, A.; Peeters, F.M.; Chan, W.K.; Florez, L.T.; Harbison, J.P. |
Novel nonlinear transport phenomena in a triangular quantum well |
1992 |
Semiconductor science and technology: B |
7 |
4 |
UA library record; WoS full record; WoS citing articles |
| Xu, W.; Peeters, F.M.; Devreese, J.T. |
Warm-electron transport in a two-dimensional semiconductor |
1992 |
Semiconductor science and technology |
7 |
3 |
UA library record; WoS full record; WoS citing articles |
| Zebrowski, D.P.; Peeters, F.M.; Szafran, B. |
Driven spin transitions in fluorinated single- and bilayer-graphene quantum dots |
2017 |
Semiconductor science and technology |
32 |
|
UA library record; WoS full record |
| Denneulin, T.; Rouvière, J.L.; Béché, A.; Py, M.; Barnes, J.P.; Rochat, N.; Hartmann, J.M.; Cooper, D. |
The reduction of the substitutional C content in annealed Si/SiGeC superlattices studied by dark-field electron holography |
2011 |
Semiconductor science and technology |
26 |
|
UA library record; WoS full record; WoS citing articles |
| Prabhakara, V.; Jannis, D.; Béché, A.; Bender, H.; Verbeeck, J. |
Strain measurement in semiconductor FinFET devices using a novel moiré demodulation technique |
2019 |
Semiconductor science and technology |
|
8 |
UA library record; WoS full record; WoS citing articles |
| Schryvers, D.; Cao, S.; Tirry, W.; Idrissi, H.; Van Aert, S. |
Advanced three-dimensional electron microscopy techniques in the quest for better structural and functional materials |
2013 |
Science and technology of advanced materials |
14 |
6 |
UA library record; WoS full record; WoS citing articles |
| Bissonnette-Dulude, J.; Heirman, P.; Coulombe, S.; Bogaerts, A.; Gervais, T.; Reuter, S. |
Coupling the COST reference plasma jet to a microfluidic device: a computational study |
2024 |
Plasma sources science and technology |
33 |
|
UA library record; WoS full record |
| Vanraes, P.; Parayil Venugopalan, S.; Besemer, M.; Bogaerts, A. |
Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling |
2023 |
Plasma Sources Science and Technology |
32 |
|
UA library record; WoS full record; WoS citing articles |
| Albrechts, M.; Tsonev, I.; Bogaerts, A. |
Investigation of O atom kinetics in O2plasma and its afterglow |
2024 |
Plasma Sources Science and Technology |
33 |
|
UA library record; WoS full record |
| Kolev, S.; Bogaerts, A. |
A 2D model for a gliding arc discharge |
2015 |
Plasma sources science and technology |
24 |
34 |
UA library record; WoS full record; WoS citing articles |
| Bultinck, E.; Bogaerts, A. |
Characterization of an Ar/O2 magnetron plasma by a multi-species Monte Carlo model |
2011 |
Plasma sources science and technology |
20 |
7 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A. |
Comprehensive modelling network for dc glow discharges in argon |
1999 |
Plasma sources science and technology |
8 |
27 |
UA library record; WoS full record; WoS citing articles |
| Tinck, S.; Bogaerts, A. |
Computer simulations of an oxygen inductively coupled plasma used for plasma-assisted atomic layer deposition |
2011 |
Plasma sources science and technology |
20 |
11 |
UA library record; WoS full record; WoS citing articles |
| Paulussen, S.; Verheyde, B.; Tu, X.; De Bie, C.; Martens, T.; Petrovic, D.; Bogaerts, A.; Sels, B. |
Conversion of carbon dioxide to value-added chemicals in atmospheric pressure dielectric barrier discharges |
2010 |
Plasma sources science and technology |
19 |
116 |
UA library record; WoS full record; WoS citing articles |
| De Bie, C.; Martens, T.; van Dijk, J.; Paulussen, S.; Verheyde, B.; Corthals, S.; Bogaerts, A. |
Dielectric barrier discharges used for the conversion of greenhouse gases: modeling the plasma chemistry by fluid simulations |
2011 |
Plasma sources science and technology |
20 |
38 |
UA library record; WoS full record; WoS citing articles |
| Peerenboom, K.; Parente, A.; Kozák, T.; Bogaerts, A.; Degrez, G. |
Dimension reduction of non-equilibrium plasma kinetic models using principal component analysis |
2015 |
Plasma sources science and technology |
24 |
11 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
| Liu, Y.-X.; Zhang, Q.-Z.; Liu, L.; Song, Y.-H.; Bogaerts, A.; Wang, Y.-N. |
Electron bounce resonance heating in dual-frequency capacitively coupled oxygen discharges |
2013 |
Plasma sources science and technology |
22 |
20 |
UA library record; WoS full record; WoS citing articles |
| Yan, M.; Bogaerts, A.; Goedheer, W.J.; Gijbels, R. |
Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges |
2000 |
Plasma sources science and technology |
9 |
21 |
UA library record; WoS full record; WoS citing articles |
| Van Laer, K.; Tinck, S.; Samara, V.; de Marneffe, J.F.; Bogaerts, A. |
Etching of low-k materials for microelectronics applications by means of a N2/H2 plasma : modeling and experimental investigation |
2013 |
Plasma sources science and technology |
22 |
13 |
UA library record; WoS full record; WoS citing articles |
| Kozák, T.; Bogaerts, A. |
Evaluation of the energy efficiency of CO2 conversion in microwave discharges using a reaction kinetics model |
2015 |
Plasma sources science and technology |
24 |
100 |
UA library record; WoS full record; WoS citing articles |
| Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
| Zhang, Q.-Z.; Liu, Y.-X.; Jiang, W.; Bogaerts, A.; Wang, Y.-N. |
Heating mechanism in direct current superposed single-frequency and dual-frequency capacitively coupled plasmas |
2013 |
Plasma sources science and technology |
22 |
9 |
UA library record; WoS full record; WoS citing articles |
| Bogaerts, A.; Okhrimovskyy, A.; Baguer, N.; Gijbels, R. |
Hollow cathode discharges with gas flow: numerical modelling for the effect on the sputtered atoms and the deposition flux |
2005 |
Plasma sources science and technology |
14 |
9 |
UA library record; WoS full record; WoS citing articles |
