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Author Luo, H.; Liang, Q.; Guo, A.; Yu, Y.; Peng, H.; Gao, X.; Hu, Y.; Su, X.; Uher, C.; Zheng, Y.; Yang, D.; Wang, X.; Zhang, Q.; Tang, X.; Liu, S.; Van Tendeloo, G.; Zhang, S.; Wu, J. url  doi
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  Title Current induced electromechanical strain in thin antipolar Ag₂Se semiconductor Type A1 Journal article
  Year (down) 2025 Publication Nature communications Abbreviated Journal  
  Volume 16 Issue 1 Pages 1818-8  
  Keywords A1 Journal article; Engineering sciences. Technology; Electron microscopy for materials research (EMAT)  
  Abstract Electromechanical coupling permits energy conversion between electrical and elastic forms, with wide applications1,2. This conversion is usually observed in dielectric materials as piezoelectricity and electrostriction3, 4, 5, 6-7. Electromechanical coupling response has also been observed in semiconductors8, however, the mechanism in semiconductors with a small bandgap remains contentious. Here we present a breakthrough discovery of a giant electromechanical strain triggered by the electric current in thin antipolar Ag2Se semiconductor. This phenomenon is made possible by the alteration of dipoles at a low current density (step I), followed by a phase transition under a moderate current density (step II), leading to a local strain of 6.7% measured by in-situ transmission electron microscopy. Our finding demonstrates that electric current has both thermal and athermal effect (e.g. alteration of dipoles and interaction of dipole vortices with the electric current). This strain allows for the concurrent control of electroelastic deformation and electric conductivity.  
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  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos WOS:001440750000012 Publication Date 2025-02-20  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 2041-1723 ISBN Additional Links UA library record; WoS full record  
  Impact Factor Times cited Open Access  
  Notes Approved no  
  Call Number UA @ admin @ c:irua:213283 Serial 9420  
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