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Author |
Meng, S.; Cui, Z.; Chen, Q.; Zhang, H.; Li, S.; Neyts, E.C.; Vlasov, E.; Jenkinson, K.; Bals, S.; Yang, D.; Liu, M.; Liu, Y.; Bogaerts, A.; Lu, A.-H.; Yi, Y. |
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Title |
Water-Promoted C–C Coupling Reaction in Plasma-Catalytic CO2Hydrogenation for Ethanol Production |
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A1 Journal Article |
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Year  |
2025 |
Publication |
ACS Catalysis |
Abbreviated Journal |
ACS Catal. |
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Volume |
15 |
Issue |
4 |
Pages |
3236-3246 |
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Keywords |
A1 Journal Article; CO2 hydrogenation, plasma catalysis, C2H5OH synthesis, C−C coupling, water-assisted catalysis, copper-based catalysts, DFT calculations; Plasma, laser ablation and surface modeling Antwerp (PLASMANT) ; |
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Abstract |
The conversion of CO2 into alcohols has attracted widespread interest. Herein, we present an approach for the plasma-catalytic CO2 hydrogenation to ethanol over a Cu2O/CeO2 catalyst under atmospheric pressure at a low temperature of ∼75 °C. The Cu2O/CeO2 catalyst initially exhibits low ethanol selectivity (2.1%), which dramatically increases to 56% (78% total alcohols selectivity) with the assistance of water. D2O and H2 18O isotope-tracing experiments reveal the partial decomposition of water and the active involvement of its derivatives in the multistep pathway for ethanol synthesis. The multiple roles of H2O in switching alcohols production from methanol to ethanol are investigated. The plasma-generated OH in both adsorbed and radical states promotes C−C coupling via CO-H2CO bonding and facilitates hydrogenation through proton transfer. Additionally, the presence of adsorbed H2O and OH enhances the desorption of ethanol, further enhancing alcohol selectivity. It is envisaged that these findings would inspire value-added transformation of CO2 to produce higher alcohols and pave the way for efficient chemical processes. |
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Publication Date |
2025-02-21 |
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ISSN |
2155-5435 |
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Impact Factor |
12.9 |
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Open Access |
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Notes |
Universiteit Antwerpen; European Commission, 823717 ; National Natural Science Foundation of China, 21503032 22272015 22472018 ; European Commission, 810182 ; |
Approved |
Most recent IF: 12.9; 2025 IF: 10.614 |
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Call Number |
PLASMANT @ plasmant @ |
Serial |
9361 |
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