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Author Liu, R.; Li, S.; Chen, Q.; Li, D.; Zhao, J.; Li, C.; Gao, X.; Zhao, W.; Wang, L.; Peng, C.; Bogaerts, A.; Guo, H.; Yi, Y. pdf  url
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  Title Plasma-driven non-oxidative coupling of methane to ethylene and hydrogen at mild temperature over CuxO/CeO2 catalyst Type A1 Journal Article
  Year (down) 2024 Publication Journal of Catalysis Abbreviated Journal Journal of Catalysis  
  Volume 440 Issue Pages 115810  
  Keywords A1 Journal Article; Methane Non-oxidative Coupling Plasma Catalysis Ethylene Copper-Ceria catalyst; Plasma, laser ablation and surface modeling Antwerp (PLASMANT) ;  
  Abstract We report one-step non-oxidative coupling of methane (CH4) to ethylene (C2H4) at atmospheric pressure and mild temperature (ca. 180–190 ◦C), by a combination of non-thermal plasma and a CuOx/CeO2 catalyst. The C2H4 selectivity gradually increases during an induction period. The corresponding spent catalysts at different stages were systematically characterized to disclose the evolution of the CuOx/CeO2 catalyst. During the induction period, the CuO/CeO2 catalyst was partially reduced to generate Cu+, Ce3+ and Ov species, which accompany the formation of Cu+-Ov-Ce3+ sites, as proven by XRD, HRTEM, XPS, Raman, EPR and H2-TPR. In addition, the C2H4 selectivity is proportional to the fraction of Cu+, Ce3+, Ov and Cu-O-Ce species, which indicates that Cu+-Ov-Ce3+ is the active site for non-oxidative coupling of CH4 to C2H4. Furthermore, in-situ FTIR results indicate that the Cu+-Ov-Ce3+ interface sites can promote dehydrogenation of CH3* (from CH4 plasma) to produce CH2* on the catalyst surface, which is the basic reason why CuOx/CeO2 acts as a catalyst in speeding up the non-oxidative coupling of CH4 for C2H4 production.  
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  Language Wos Publication Date 2024-10-19  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0021-9517 ISBN Additional Links  
  Impact Factor 7.3 Times cited Open Access  
  Notes This work was supported by the National Natural Science Foundation of China [22472018]. The China Scholarship Council is gratefully acknowledged. The instrumental analysis center of Dalian University of Technology is also gratefully acknowledged. Approved Most recent IF: 7.3; 2024 IF: 6.844  
  Call Number PLASMANT @ plasmant @ Serial 9343  
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