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Author Meng, S.; Li, S.; Sun, S.; Bogaerts, A.; Liu, Y.; Yi, Y. pdf  url
doi  openurl
  Title NH3 decomposition for H2 production by thermal and plasma catalysis using bimetallic catalysts Type A1 Journal article
  Year (down) 2024 Publication Chemical engineering science Abbreviated Journal Chemical Engineering Science  
  Volume 283 Issue Pages 119449  
  Keywords A1 Journal article; Plasma Lab for Applications in Sustainability and Medicine – Antwerp (PLASMANT)  
  Abstract Plasma catalysis has emerged as a promising approach for driving thermodynamically unfavorable chemical

reactions. Nevertheless, comprehending the mechanisms involved remains a challenge, leading to uncertainty

about whether the optimal catalyst in plasma catalysis aligns with that in thermal catalysis. In this research, we

explore this question by studying monometallic catalysts (Fe, Co, Ni and Mo) and bimetallic catalysts (Fe-Co, Mo-

Co, Fe-Ni and Mo-Ni) in both thermal catalytic and plasma catalytic NH3 decomposition. Our findings reveal that

the Fe-Co bimetallic catalyst exhibits the highest activity in thermal catalysis, the Fe-Ni bimetallic catalyst

outperforms others in plasma catalysis, indicating a discrepancy between the optimal catalysts for the two

catalytic modes in NH3 decomposition. Comprehensive catalyst characterization, kinetic analysis, temperature

program surface reaction experiments and plasma diagnosis are employed to discuss the key factors influencing

NH3 decomposition performance.
 
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  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 001105312500001 Publication Date 2023-10-28  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 0009-2509 ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 4.7 Times cited Open Access Not_Open_Access  
  Notes Universiteit Antwerpen, 32249 ; National Natural Science Foundation of China, 21503032 ; PetroChina Innovation Foundation, 2018D-5007-0501 ; Approved Most recent IF: 4.7; 2024 IF: 2.895  
  Call Number PLASMANT @ plasmant @c:irua:201009 Serial 8967  
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