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Author |
Macke, S.; Radi, A.; Hamann-Borrero, J.E.; Verna, A.; Bluschke, M.; Brück, S.; Goering, E.; Sutarto, R.; He, F.; Cristiani, G.; Wu, M.; Benckiser, E.; Habermeier, H.-U.; Logvenov, G.; Gauquelin, N.; Botton, G.A; Kajdos, A.P.; Stemmer, S.; Sawatzky,G.A.; Haverkort, M.W.; Keimer, B.; Hinkov, V. |
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Title |
Element Specific Monolayer Depth Profiling |
Type |
A1 Journal Article |
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Year  |
2014 |
Publication |
Advanced Materials |
Abbreviated Journal |
Adv Mater |
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Volume |
26 |
Issue |
38 |
Pages |
6554-6559 |
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Keywords |
A1 Journal Article; Electron Microscopy for Materials Science (EMAT) |
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Abstract |
The electronic phase behavior and functionality of interfaces and surfaces in complex materials are strongly correlated to chemical composition profiles, stoichiometry and intermixing. Here a novel analysis scheme for resonant X-ray reflectivity maps is introduced to determine such profiles, which is element specific and non-destructive, and which exhibits atomic-layer resolution and a probing depth of hundreds of nanometers. |
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Editor |
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Language |
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Wos |
000343763200004 |
Publication Date |
2014-08-08 |
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Series Title |
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Series Volume |
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Edition |
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ISSN |
1521-4095 |
ISBN |
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Impact Factor |
19.791 |
Times cited |
34 |
Open Access |
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Notes |
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Approved |
Most recent IF: 19.791; 2014 IF: NA |
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Call Number |
EMAT @ emat @ |
Serial |
4541 |
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