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Author Carraro, G.; Gasparotto, A.; Maccato, C.; Bontempi, E.; Lebedev, O.I.; Turner, S.; Sada, C.; Depero, L.E.; Van Tendeloo, G.; Barreca, D. pdf  doi
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  Title Fluorine doped Fe2O3 nanostructures by a one-pot plasma-assisted strategy Type A1 Journal article
  Year (down) 2013 Publication RSC advances Abbreviated Journal Rsc Adv  
  Volume 3 Issue 45 Pages 23762-23768  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract The present work reports on the synthesis of fluorine doped Fe2O3 nanomaterials by a single-step plasma enhanced-chemical vapor deposition (PE-CVD) strategy. In particular, Fe(hfa)2TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N′,N′-tetramethylethylenediamine) was used as molecular source for both Fe and F in Ar/O2 plasmas. The structure, morphology and chemical composition of the synthesized nanosystems were thoroughly analyzed by two-dimensional X-ray diffraction (XRD2), field emission-scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and transmission electron microscopy (TEM). A suitable choice of processing parameters enabled the selective formation of α-Fe2O3 nanomaterials, characterized by an homogeneous F doping, even at 100 °C. Interestingly, a simultaneous control of the system nanoscale organization and fluorine content could be achieved by varying the sole growth temperature. The tailored properties of the resulting materials can be favourably exploited for several technological applications, ranging from photocatalysis, to photoelectrochemical cells and gas sensing.  
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  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000326395800141 Publication Date 2013-10-03  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 2046-2069; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 3.108 Times cited 23 Open Access  
  Notes Fwo Approved Most recent IF: 3.108; 2013 IF: 3.708  
  Call Number UA @ lucian @ c:irua:111091 Serial 1237  
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