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Author Tian, H.; Schryvers, D.; Mohanchandra, K.P.; Carman, G.P.; van Humbeeck, J. pdf  doi
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  Title Fabrication and characterization of functionally graded Ni-Ti multilayer thin films Type A1 Journal article
  Year (down) 2009 Publication Functional materials letters Abbreviated Journal Funct Mater Lett  
  Volume 2 Issue 2 Pages 61-66  
  Keywords A1 Journal article; Electron microscopy for materials research (EMAT)  
  Abstract A functionally graded multilayer NiTi thin film was deposited on a SiO2/Si substrate by d.c. sputtering using a ramped heated NiTi alloy target. The stand-alone films were crystallized at 500°C in vacuum better than 10-7 Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni.  
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  Corporate Author Thesis  
  Publisher Place of Publication Editor  
  Language Wos 000271077000003 Publication Date 2009-07-22  
  Series Editor Series Title Abbreviated Series Title  
  Series Volume Series Issue Edition  
  ISSN 1793-6047;1793-7213; ISBN Additional Links UA library record; WoS full record; WoS citing articles  
  Impact Factor 1.234 Times cited 9 Open Access  
  Notes Fwo Approved Most recent IF: 1.234; 2009 IF: 2.561  
  Call Number UA @ lucian @ c:irua:77655 Serial 1165  
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