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Author Title Year (down) Publication Volume Times cited Additional Links
Nistor, L.C.; Richard, O.; Zhao, O.; Bender, H.; Stesmans, A.; Van Tendeloo, G. A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films 2003 Institute of physics conference series T2 – Microscopy of semiconducting materials UA library record; WoS full record;