NANOlab Center of Excellence literature database -- Query Results

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	Author	Title	Year	Publication	Volume	Times cited	Additional Links	Links
	Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A.	Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF₄ plasma	2013	Plasma sources science and technology	22	11	UA library record; WoS full record; WoS citing articles
	Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A.	The effect of F₂ attachment by low-energy electrons on the electron behaviour in an Ar/CF₄ inductively coupled plasma	2012	Plasma sources science and technology	21	23	UA library record; WoS full record; WoS citing articles

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