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Strain-driven modulation of the electronic, optical and thermoelectric properties of beta-antimonene monolayer : a hybrid functional study”. Hoat DM, Nguyen DK, Bafekry A, Van On V, Ul Haq B, Rivas-Silva JF, Cocoletzi GH, Materials Science In Semiconductor Processing 131, 105878 (2021). http://doi.org/10.1016/J.MSSP.2021.105878
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CVD growth of monolayer WS2 through controlled seed formation and vapor density”. Yorulmaz B, Ozden A, Sar H, Ay F, Sevik C, Perkgoz NK, Materials science in semiconductor processing 93, 158 (2019). http://doi.org/10.1016/J.MSSP.2018.12.035
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Influence of 4H-SiC substrate miscut on the epitaxy and microstructure of AlGaN/GaN heterostructures”. Gkanatsiou A, Lioutas CB, Frangis N, Polychroniadis EK, Prystawko P, Leszczynski M, Altantzis T, Van Tendeloo G, Materials science in semiconductor processing 91, 159 (2019). http://doi.org/10.1016/j.mssp.2018.11.008
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The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures”. Stuer C, van Landuyt J, Bender H, Rooyackers R, Badenes G, Materials science in semiconductor processing 4, 117 (2001). http://doi.org/10.1016/S1369-8001(00)00110-4
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Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy”. Hens S, van Landuyt J, Bender H, Boullart W, Vanhaelemeersch S, Materials science in semiconductor processing 4, 109 (2001). http://doi.org/10.1016/S1369-8001(00)00147-5
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