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Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes”. Moors K, Soree B, Tokei Z, Magnus W, On Ultimate Integration On Silicon (eurosoi-ulis) , 201 (2015)
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A new method to calculate leakage current and its applications for sub-45nm MOSFETs”. Lujan GS, Magnus W, Soree B, Pourghaderi MA, Veloso A, van Dal MJH, Lauwers A, Kubicek S, De Gendt S, Heyns M, De Meyer K, Solid-State Device Research (ESSDERC), European Conference T2 – ESSDERC 2005 : proceedings of 35th European Solid-State Device Research Conference, September 12-16, 2005, Grenoble, France. Ieee, S.l., page 489 (2005).
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