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| Author | Nistor, L.C.; Richard, O.; Zhao, C.; Bender, H.; Van Tendeloo, G. | ||||
| Title | Thermal stability of atomic layer deposited Zr:Al mixed oxide thin films: an in situ transmission electron microscopy study | Type | A1 Journal article | ||
Year  |
2005 | Publication | Journal of materials research | Abbreviated Journal | J Mater Res |
| Volume | 20 | Issue | 7 | Pages | 1741-1750 |
| Keywords | A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
| Abstract | |||||
| Address | |||||
| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | New York, N.Y. | Editor | ||
| Language | Wos | 000230296100012 | Publication Date | 2005-07-12 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 0884-2914;2044-5326; | ISBN | Additional Links | UA library record; WoS full record | |
| Impact Factor | 1.673 | Times cited | Open Access | ||
| Notes | Bil 01/73; IAP V-1 | Approved | Most recent IF: 1.673; 2005 IF: 2.104 | ||
| Call Number | UA @ lucian @ c:irua:54884 | Serial | 3631 | ||
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