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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study 2015 Journal of physics: D: applied physics 48 9 UA library record; WoS full record; WoS citing articles pdf url doi
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