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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; Tillocher, T.; Dussart, R.; Neyts, E.C.; Bogaerts, A. Elucidating the effects of gas flow rate on an SF6inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation 2016 Journal of physics: D: applied physics 49 1 UA library record; WoS full record; WoS citing articles pdf url doi
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