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  Author Title Year (down) Publication Volume Times cited Additional Links Links
Tinck, S.; De Schepper, P.; Bogaerts, A. Numerical investigation of SiO2 coating deposition in wafer processing reactors with SiCl4/O2/Ar inductively coupled plasmas 2013 Plasma processes and polymers 10 3 UA library record; WoS full record; WoS citing articles pdf doi
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