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| Author | Tian, H.; Schryvers, D.; Mohanchandra, K.P.; Carman, G.P.; van Humbeeck, J. | ||||
| Title | Fabrication and characterization of functionally graded Ni-Ti multilayer thin films | Type | A1 Journal article | ||
Year  |
2009 | Publication | Functional materials letters | Abbreviated Journal | Funct Mater Lett |
| Volume | 2 | Issue | 2 | Pages | 61-66 |
| Keywords | A1 Journal article; Electron microscopy for materials research (EMAT) | ||||
| Abstract | A functionally graded multilayer NiTi thin film was deposited on a SiO2/Si substrate by d.c. sputtering using a ramped heated NiTi alloy target. The stand-alone films were crystallized at 500°C in vacuum better than 10-7 Torr. Transmission electron microscopy micrographs taken along the film cross section show two distinct regions, thin and thick, with weak R and B2 phases, respectively. The film compositions along the thickness were measured and quantified using the standard-less EELSMODEL method. The film deposited during the initial thermal ramp (thin regions) displays an average of 54 at.% Ni while the film deposited at a more elevated target temperature (thick regions) shows about 51 at.% Ni. | ||||
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| Corporate Author | Thesis | ||||
| Publisher | Place of Publication | Editor | |||
| Language | Wos | 000271077000003 | Publication Date | 2009-07-22 | |
| Series Editor | Series Title | Abbreviated Series Title | |||
| Series Volume | Series Issue | Edition | |||
| ISSN | 1793-6047;1793-7213; | ISBN | Additional Links | UA library record; WoS full record; WoS citing articles | |
| Impact Factor | 1.234 | Times cited | 9 | Open Access | |
| Notes | Fwo | Approved | Most recent IF: 1.234; 2009 IF: 2.561 | ||
| Call Number | UA @ lucian @ c:irua:77655 | Serial | 1165 | ||
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