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Author |
Title |
Year |
Publication |
Volume  |
Times cited |
Additional Links |
Links |
|
|
Bogaerts, A.; Yan, M.; Gijbels, R.; Goedheer, W. |
Modeling of ionization of argon in an analytical capacitively coupled radio-frequency glow discharge |
1999 |
Journal of applied physics |
86 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Role of Ar2+ and Ar+2 ions in a direct current argon glow discharge: a numerical description |
1999 |
Journal of applied physics |
86 |
50 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Pokatilov, E.P.; Fomin, V.M.; Balaban, S.N.; Gladilin, V.N.; Klimin, S.N.; Devreese, J.T.; Magnus, W.; Schoenmaker, W.; Collaert, N.; van Rossum, M.; de Meyer, K. |
Distribution of fields and charge carriers in cylindrical nanosize silicon-based metal-oxide-semiconductor structures |
1999 |
Journal Of Applied Physics |
85 |
16 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Buschmann, V.; Rodewald, M.; Fuess, H.; Van Tendeloo, G.; Schäffer, C. |
High resolution electron microscopy study of molecular beam epitaxy grown CoSi2/Si1-xGex/Si(100) heterostructurs |
1999 |
Journal of applied physics |
85 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R.; Vlcek, J. |
Collisional-radiative model for an argon glow discharge |
1998 |
Journal of applied physics |
84 |
138 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Milants, K.; Verheyden, J.; Barancira, T.; Deweerd, W.; Pattyn, H.; Bukshpan, S.; Williamson, D.L.; Vermeiren, F.; Van Tendeloo, G.; Vlekken, C.; Libbrecht, S.; van Haesendonck, C. |
Size distribution and magnetic behavior of lead inclusions in silicon single crystals |
1997 |
Journal of applied physics |
81 |
8 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Hai, G.-Q.; Studart, N.; Peeters, F.M.; Koenraad, P.M.; Wolter, J.H. |
Intersubband-coupling and screening effects on the electron transport in a quasi-two-dimensional δ-doped semiconductor system |
1996 |
Journal of applied physics |
80 |
40 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Laffez, P.; Van Tendeloo, G.; Seshadri, R.; Hervieu, M.; Martin, C.; Maignan, A.; Raveau, B. |
Microstructural and physical properties of layered manganite oxides related to the magnetoresistive perovskites |
1996 |
Journal of applied physics |
80 |
36 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bernaerts, D.; Van Tendeloo, G.; Amelinckx, S.; Hevesi, K.; Gensterblum, G.; Yu, L.M.; Pireaux, J.J.; Grey, F.; Bohr, J. |
Structural defects and epitaxial rotation of C60 and C70 (111) films on GeS(001) |
1996 |
Journal of applied physics |
80 |
6 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
Role of sputtered Cu atoms and ions in a direct current glow discharge: combined fluid and Monte Carlo model |
1996 |
Journal of applied physics |
79 |
81 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Chu, D.P.; Peeters, F.M.; Kolodinski, S.; Roca, E. |
Theoretical investigation of CoSi2/Si1-xGex detectors: influence of a Si tunneling barrier on the electro-optical characteristics |
1996 |
Journal of applied physics |
79 |
3 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid Monte Carlo-fluid model of a direct current glow discharge |
1995 |
Journal of applied physics |
78 |
117 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R. |
The role of fast argon ions and atoms in the ionization of argon in a direct current glow discharge: a mathematical simulation |
1995 |
Journal of applied physics |
78 |
60 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; van Straaten, M.; Gijbels, R. |
Description of the thermalization process of the sputtered atoms in a glow discharge using a 3-dimensional Monte Carlo method |
1995 |
Journal of applied physics |
77 |
87 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Ishikawa, K.; Karahashi, K.; Ichiki, T.; Chang, J.P.; George, S.M.; Kessels, W.M.M.; Lee, H.J.; Tinck, S.; Um, J.H.; Kinoshita, K. |
Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? |
2017 |
Japanese journal of applied physics |
56 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Ozden, A.; Ay, F.; Sevik, C.; Perkgoz, N.K. |
CVD growth of monolayer MoS2: Role of growth zone configuration and precursors ratio |
2017 |
Japanese journal of applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
|
|
|
Vereecke, B.; van der Veen, M.H.; Sugiura, M.; Kashiwagi, Y.; Ke, X.; Cott, D.J.; Hantschel, T.; Huyghebaert, C.; Tökei, Z. |
Wafer-level electrical evaluation of vertical carbon nanotube bundles as a function of growth temperature |
2013 |
Japanese journal of applied physics |
52 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
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