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Author Nistor, L.C.; Richard, O.; Zhao, O.; Bender, H.; Stesmans, A.; Van Tendeloo, G.
Title A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films Type A1 Journal article
Year 2003 Publication Institute of physics conference series T2 – Microscopy of semiconducting materials Abbreviated Journal
Volume (down) Issue Pages 397-400
Keywords A1 Journal article; Electron microscopy for materials research (EMAT)
Abstract The thermal stability of amorphous Al2O3 films (similar to8 and 80 nut thick) deposited by atomic layer deposition on HF-last and thin SiO2 covered (001) Si substrates is studied by transmission electron microscopy. The layers are in- and ex-situ annealed in the same temperature range.
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Corporate Author Thesis
Publisher Iop Place of Publication Cambridge Editor
Language Wos Publication Date 0000-00-00
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 0-7503-0979-2 ISBN Additional Links UA library record; WoS full record;
Impact Factor Times cited Open Access
Notes Approved Most recent IF: NA
Call Number UA @ lucian @ c:irua:54860 Serial 2048
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