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Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links  |
Links |
|
|
Müller, M.; Turner, S.; Lebedev, O.I.; Wang, Y.; Van Tendeloo, G.; Fischer, R.A. |
Au@MOF-5 and Au/Mox@MOF-5 (M = Zn, Ti; x = 1, 2) : preparation and microstructural characterisation |
2011 |
European journal of inorganic chemistry |
|
75 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Mao, M.; Wang, Y.N.; Bogaerts, A. |
Numerical study of the plasma chemistry in inductively coupled SF6 and SF6/AR plasmas used for deep silicon etching applications |
2011 |
Journal of physics: D: applied physics |
44 |
20 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Wang, Y.; Yu, M.Y.; Chen, Z.Y. |
Coherent relativistic wake wave of a charged object moving steadily in a plasma |
2011 |
Physica scripta |
84 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 1 : transient behaviour of electrodynamics and power deposition |
2012 |
Journal of physics: D: applied physics |
45 |
57 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhang, Y.-R.; Xu, X.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the phase-shift effect in hydrogen capacitively coupled plasmas: 2 : radial uniformity of the plasma characteristics |
2012 |
Journal of physics: D: applied physics |
45 |
15 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
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