|  | Author | Title | Year  | Publication | Volume | Times cited | Additional Links | Links | 
	|  | Ishikawa, K.; Karahashi, K.; Ichiki, T.; Chang, J.P.; George, S.M.; Kessels, W.M.M.; Lee, H.J.; Tinck, S.; Um, J.H.; Kinoshita, K. | Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? | 2017 | Japanese journal of applied physics | 56 | 18 | UA library record; WoS full record; WoS citing articles |       | 
	|  | Ozden, A.; Ay, F.; Sevik, C.; Perkgoz, N.K. | CVD growth of monolayer MoS2: Role of growth zone configuration and precursors ratio | 2017 | Japanese journal of applied physics | 56 |  | UA library record; WoS full record; WoS citing articles |   | 
	|  | Vereecke, B.; van der Veen, M.H.; Sugiura, M.; Kashiwagi, Y.; Ke, X.; Cott, D.J.; Hantschel, T.; Huyghebaert, C.; Tökei, Z. | Wafer-level electrical evaluation of vertical carbon nanotube bundles as a function of growth temperature | 2013 | Japanese journal of applied physics | 52 | 5 | UA library record; WoS full record; WoS citing articles |     | 
	|  | Bogaerts, A.; Gijbels, R.; Goedheer, W. | Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model | 1999 | Japanese journal of applied physics | 38 | 45 | UA library record; WoS full record; WoS citing articles |   |