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\bibitem{Dhayalan_etal2018} {\textquotedblleft}\textit{On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications}{\textquotedblright}. Dhayalan SK, Kujala J, Slotte J, Pourtois G, Simoen E, Rosseel E, Hikavyy A, Shimura Y, Loo R, Vandervorst W, ECS journal of solid state science and technology \textbf{7}, P228 (2018).   http://doi.org/10.1149/2.0071805JSS

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