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\bibitem{Loo_etal2018} {\textquotedblleft}\textit{Epitaxial CVD Growth of Ultra-Thin Si Passivation Layers on Strained Ge Fin Structures}{\textquotedblright}. Loo R, Arimura H, Cott D, Witters L, Pourtois G, Schulze A, Douhard B, Vanherle W, Eneman G, Richard O, Favia P, Mitard J, Mocuta D, Langer R, Collaert N, ECS journal of solid state science and technology \textbf{7}, P66 (2018).   http://doi.org/10.1149/2.0191802JSS

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