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\bibitem{Tinck_etal2016} {\textquotedblleft}\textit{Elucidating the effects of gas flow rate on an SF$_{6}$inductively coupled plasma and on the silicon etch rate, by a combined experimental and theoretical investigation}{\textquotedblright}. Tinck S, Tillocher T, Dussart R, Neyts EC, Bogaerts A, Journal of physics: D: applied physics \textbf{49}, 385201 (2016).   http://doi.org/10.1088/0022-3727/49/38/385201

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