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\bibitem{Georgieva+Bogaerts2005} {\textquotedblleft}\textit{Numerical simulation of dual frequency etching reactors: influence of the external process parameters on the plasma characteristics}{\textquotedblright}. Georgieva V, Bogaerts A, Journal of applied physics \textbf{98}, 023308 (2005).   http://doi.org/10.1063/1.1989439

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