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\bibitem{Nistor_etal2003} {\textquotedblleft}\textit{A microstructural study of the thermal stability of atomic layer deposited Al$_{2}$O$_{3}$ thin films}{\textquotedblright}. Nistor LC, Richard O, Zhao O, Bender H, Stesmans A, Van Tendeloo G, Institute of physics conference series
T2 -- Microscopy of semiconducting materials , 397 (2003)

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