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\bibitem{Mahieu_etal2005} {\textquotedblleft}\textit{Influence of the Ar/O$_{2}$ ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering}{\textquotedblright}. Mahieu S, Ghekiere P, de Winter G, Depla D, de Gryse R, Lebedev OI, Van Tendeloo G, Thin solid films : an international journal on the science and technology of thin and thick films \textbf{484}, 18 (2005).   http://doi.org/10.1016/j.tsf.2005.01.021

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