|
Author |
Title |
Year |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
Ishikawa, K.; Karahashi, K.; Ichiki, T.; Chang, J.P.; George, S.M.; Kessels, W.M.M.; Lee, H.J.; Tinck, S.; Um, J.H.; Kinoshita, K. |
Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions? |
2017 |
Japanese journal of applied physics |
56 |
18 |
UA library record; WoS full record; WoS citing articles |
|
|
Ozden, A.; Ay, F.; Sevik, C.; Perkgoz, N.K. |
CVD growth of monolayer MoS2: Role of growth zone configuration and precursors ratio |
2017 |
Japanese journal of applied physics |
56 |
|
UA library record; WoS full record; WoS citing articles |
|
|
Vereecke, B.; van der Veen, M.H.; Sugiura, M.; Kashiwagi, Y.; Ke, X.; Cott, D.J.; Hantschel, T.; Huyghebaert, C.; Tökei, Z. |
Wafer-level electrical evaluation of vertical carbon nanotube bundles as a function of growth temperature |
2013 |
Japanese journal of applied physics |
52 |
5 |
UA library record; WoS full record; WoS citing articles |
|
|
Bogaerts, A.; Gijbels, R.; Goedheer, W. |
Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: combined Monte Carlo and fluid model |
1999 |
Japanese journal of applied physics |
38 |
45 |
UA library record; WoS full record; WoS citing articles |
|