1. “Round-robin investigation of silicon-oxide on silicon reference materials for ellipsometry”.  Vanhellemont J, Maes HE, Schaekers M, Armigliato A, Cerva H, Cullis A, de Sande J, Dinges H, Hallais J, Nayar V, Pickering C, Stehlé JL, Van Landuyt J, Walker C, Werner H, Salieri P;, Applied surface scienceT2 – SYMP ON DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS ANALYSIS AND, FABRICATION PROCESS CONTROL, AT THE 1992 SPRING CONF OF THE EUROPEAN, MATERIALS RESEARCH SOC, JUN 02-05, 1992, STRASBOURG, FRANCE 63, 45 (1993).   http://doi.org/10.1016/0169-4332(93)90062-G