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\bibitem{Zhao_etal2012} {\textquotedblleft}\textit{The effect of F$_{2}$ attachment by low-energy electrons on the electron behaviour in an Ar/CF$_{4}$ inductively coupled plasma}{\textquotedblright}. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology \textbf{21}, 025008 (2012).   http://doi.org/10.1088/0963-0252/21/2/025008

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