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\bibitem{Vanraes_etal2021} {\textquotedblleft}\textit{Multiscale modeling of plasma{\textendash}surface interaction{\textemdash}General picture and a case study of Si and SiO$_{2}$etching by fluorocarbon-based plasmas}{\textquotedblright}. Vanraes P, Parayil Venugopalan S, Bogaerts A, Applied Physics Reviews \textbf{8}, 041305 (2021).   http://doi.org/10.1063/5.0058904

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