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\bibitem{Stuer_etal2001} {\textquotedblleft}\textit{The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures}{\textquotedblright}. Stuer C, van Landuyt J, Bender H, Rooyackers R, Badenes G, Materials science in semiconductor processing \textbf{4}, 117 (2001).   http://doi.org/10.1016/S1369-8001(00)00110-4

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