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\bibitem{Tinck_etal2011} {\textquotedblleft}\textit{Simultaneous etching and deposition processes during the etching of silicon with a Cl$_{2}$/O$_{2}$/Ar inductively coupled plasma}{\textquotedblright}. Tinck S, Bogaerts A, Shamiryan D, Plasma processes and polymers \textbf{8}, 490 (2011).   http://doi.org/10.1002/ppap.201000189

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