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\bibitem{Delabie_etal2012} {\textquotedblleft}\textit{Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substrates}{\textquotedblright}. Delabie A, Sioncke S, Rip J, Van Elshocht S, Pourtois G, Mueller M, Beckhoff B, Pierloot K, Journal of vacuum science and technology: A: vacuum surfaces and films \textbf{30}, 01a127 (2012).   http://doi.org/10.1116/1.3664090

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