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\bibitem{Mao_etal2011} {\textquotedblleft}\textit{Numerical study of the plasma chemistry in inductively coupled SF$_{6}$ and SF$_{6}$/AR plasmas used for deep silicon etching applications}{\textquotedblright}. Mao M, Wang YN, Bogaerts A, Journal of physics: D: applied physics \textbf{44}, 435202 (2011).   http://doi.org/10.1088/0022-3727/44/43/435202

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