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\bibitem{Tinck+Bogaerts2012} {\textquotedblleft}\textit{Modeling SiH$_{4}$/O$_{2}$/Ar inductively coupled plasmas used for filling of microtrenches in shallow trench isolation (STI)}{\textquotedblright}. Tinck S, Bogaerts A, Plasma processes and polymers \textbf{9}, 522 (2012).   http://doi.org/10.1002/ppap.201100093

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