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\bibitem{Ariskin_etal2009} {\textquotedblleft}\textit{Modeling of chemical processes in the low pressure capacitive radio frequency discharges in a mixture of Ar/C$_{2}$H$_{2}$}{\textquotedblright}. Ariskin DA, Schweigert IV, Alexandrov AL, Bogaerts A, Peeters FM, Journal of applied physics \textbf{105}, 063305 (2009).   http://doi.org/10.1063/1.3095760

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