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\bibitem{Tinck_etal2009} {\textquotedblleft}\textit{Investigation of etching and deposition processes of Cl$_{2}$/O$_{2}$/Ar inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments}{\textquotedblright}. Tinck S, Boullart W, Bogaerts A, Journal of physics: D: applied physics \textbf{42}, 095204 (2009).   http://doi.org/10.1088/0022-3727/42/9/095204

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