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\bibitem{Scalise_etal2011} {\textquotedblleft}\textit{Inelastic electron tunneling spectroscopy of HfO$_{2}$ gate stacks : a study based on first-principles modeling}{\textquotedblright}. Scalise E, Houssa M, Pourtois G, Afanas{\textquoteright}ev VV, Stesmans A, Applied physics letters \textbf{99}, 132101 (2011).   http://doi.org/10.1063/1.3644158

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