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\bibitem{Zhao_etal2013} {\textquotedblleft}\textit{Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF$_{4}$ plasma}{\textquotedblright}. Zhao S-X, Gao F, Wang Y-N, Bogaerts A, Plasma sources science and technology \textbf{22}, 015017 (2013).   http://doi.org/10.1088/0963-0252/22/1/015017

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