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\bibitem{VanLaer_etal2013} {\textquotedblleft}\textit{Etching of low-k materials for microelectronics applications by means of a N$_{2}$/H$_{2}$ plasma : modeling and experimental investigation}{\textquotedblright}. Van Laer K, Tinck S, Samara V, de Marneffe JF, Bogaerts A, Plasma sources science and technology \textbf{22}, 025011 (2013).   http://doi.org/10.1088/0963-0252/22/2/025011

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