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Dubourdieu, C.; Rauwel, E.; Roussel, H.; Ducroquet, F.; Hollaender, B.; Rossell, M.; Van Tendeloo, G.; Lhostis, S.; Rushworth, S. Addition of yttrium into HfO2 films: microstructure and electrical properties 2009 Journal of vacuum science and technology: A: vacuum surfaces and films 27 29 UA library record; WoS full record; WoS citing articles pdf doi
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