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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
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de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on wafer surfaces |
2000 |
Journal of the electrochemical society |
147 |
14 |
UA library record; WoS full record; WoS citing articles |
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de Witte, H.; de Gendt, S.; Douglas, M.; Conard, T.; Kenis, K.; Mertens, P.W.; Vandervorst, W.; Gijbels, R. |
Capabilities of TOF-SIMS to study the influence of different oxidation conditions on metal contamination redistribution |
1999 |
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UA library record; WoS full record; |
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de Gendt, S.; Kenis, K.; Mertens, P.W.; Heyns, M.M.; Claes, M.; Van Grieken, R.E.; Bailleul, A.; Knotter, M.; de Bokx, P.K. |
Use of grazing emission XRF spectrometry for silicon wafer surface contamination measurements |
1996 |
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UA library record |
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