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Author |
Title |
Year  |
Publication |
Volume |
Times cited |
Additional Links |
Links |
|
|
Zhang, Y.-R.; Gao, F.; Li, X.-C.; Bogaerts, A.; Wang, Y.-N. |
Fluid simulation of the bias effect in inductive/capacitive discharges |
2015 |
Journal of vacuum science and technology: A: vacuum surfaces and films |
33 |
9 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-P.; Wang, Y.-N.; Bogaerts, A. |
Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma |
2015 |
Journal of applied physics |
118 |
1 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Zhang, Y.-R.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Bulk plasma fragmentation in a C4F8 inductively coupled plasma : a hybrid modelling study |
2015 |
Journal of applied physics |
117 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
Gas ratio effects on the Si etch rate and profile uniformity in an inductively coupled Ar/CF4 plasma |
2013 |
Plasma sources science and technology |
22 |
11 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Zhao, S.-X.; Gao, F.; Wang, Y.-N.; Bogaerts, A. |
The effect of F2 attachment by low-energy electrons on the electron behaviour in an Ar/CF4 inductively coupled plasma |
2012 |
Plasma sources science and technology |
21 |
23 |
UA library record; WoS full record; WoS citing articles |
|
|
|
Han, Z.; Ni, J.; Smits, P.; Underhill, C.; Xie, B.; Chen, Y.; Liu, N.; Tylzanowski, P.; Parmelee, D.; Feng, P.; Ding, I.; Gao, F.; Gentz, R.; Huylebroeck, D.; Merregaert, J.; Zhang, L. |
Extracellular matrix protein 1 (ECM1) has angiogenic properties and is expressed by breast tumor cells |
2001 |
The FASEB journal |
15 |
94 |
UA library record; WoS full record; WoS citing articles |
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