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	Author	Title	Year	Publication	Volume	Times cited	Additional Links	Links
	Yu, H.; Schaekers, M.; Chew, S.A.; Eyeraert, J.-L.; Dabral, A.; Pourtois, G.; Horiguchi, N.; Mocuta, D.; Collaert, N.; De Meyer, K.	Titanium (germano-)silicides featuring 10^-9 Ω.cm² contact resistivity and improved compatibility to advanced CMOS technology	2018	2018 18th International Workshop On Junction Technology (iwjt)			UA library record; WoS full record

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