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Long-distance channeling and focusing of lasers in plasmas”. Yuan X, Yu W, Yu MY, Chen ZY, Liu JR, Lu PX, Li RX, Qian LJ, Lu BD, Physica scripta 66, 381 (2002). http://doi.org/10.1238/Physica.Regular.066a00381
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Metal and composite nanocluster precipitate formation in silicon dioxide implanted with Sb+ ions”. Ignatova VA, Lebedev OI, Watjen U, van Vaeck L, van Landuyt J, Gijbels R, Adams F, Journal of applied physics 92, 4336 (2002). http://doi.org/10.1063/1.1508425
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Modeling network for argon glow discharge plasmas with copper cathode”. Bogaerts A, Gijbels R Nova, New York, page 1 (2002).
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Modeling of a capacitively coupled radio-frequency methane plasma: comparison between a one-dimensional and a two-dimensional fluid model”. Herrebout D, Bogaerts A, Yan M, Gijbels R, Goedheer W, Vanhulsel A, Journal of applied physics 92, 2290 (2002). http://doi.org/10.1063/1.1500789
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Modeling of magnetron and glow discharges”. Bogaerts A, Kolev I, Le vide: science, technique et applications 57, 296 (2002)
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Modelling of a dielectric barrier glow discharge at atmospheric pressure in nitrogen”. Madani M, Bogaerts A, Gijbels R, Vangeneugden D, , 130 (2002)
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Observation of Sb203 nanocrystals in SiO2 after Sb ion implantation”. Ignatova VA, Lebedev OI, Wätjen U, van Vaeck L, van Landuyt J, Gijbels R, Adams F, Microchimica acta 139, 77 (2002). http://doi.org/10.1007/s006040200043
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1D fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers”. Herrebout D, Bogaerts A, Yan M, Goedheer W, Dekempeneer E, Gijbels R, Journal of applied physics 90, 570 (2001). http://doi.org/10.1063/1.1378059
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Comparison of modeling calculations with experimental results for direct current glow discharge optical emission spectrometry”. Bogaerts A, Wilken L, Hoffmann V, Gijbels R, Wetzig K, Spectrochimica acta: part B : atomic spectroscopy 56, 551 (2001). http://doi.org/10.1016/S0584-8547(01)00220-8
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Design and development of a new program for data processing of mass spectra acquired by means of a high-resolution double-focusing glow-discharge mass spectrometer”. Robben J, Dufour D, Gijbels R, Fresenius' journal of analytical chemistry 370, 663 (2001). http://doi.org/10.1007/s002160100881
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Exchange of fluorinated cyanine dyes between different types of silver halide microcrystals studied by imaging time-of-flight secondary ion mass spectrometry”. Lenaerts J, Verlinden G, van Vaeck L, Gijbels R, Geuens I, Callant P, Langmuir 17, 7332 (2001). http://doi.org/10.1021/la010862t
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Improved hybrid Monte Carlo-fluid model for the electrical characteristics in an analytical radiofrequency glow discharge in argon”. Bogaerts A, Gijbels R, Goedheer W, Journal of analytical atomic spectrometry 16, 750 (2001). http://doi.org/10.1039/b103768b
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Interactions between DC plasma and HF fields”. Cenian A, Chernukho A, Leys C, Bogaerts A, , 389 (2001)
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Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge”. Yan M, Bogaerts A, Gijbels R, Physical review : E : statistical physics, plasmas, fluids, and related interdisciplinary topics 63 (2001). http://doi.org/10.1103/PhysRevE.63.026405
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Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 16, 239 (2001). http://doi.org/10.1039/b009289o
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Modeling of bombardment induced oxidation of silicon”. de Witte H, Vandervorst W, Gijbels R, Journal of applied physics 89, 3001 (2001). http://doi.org/10.1063/1.1344581
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Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary ion-mass spectrometry (SIMS)”. Lenaerts J, Verlinden G, Ignatova VA, van Vaeck L, Gijbels R, Geuens I, Fresenius' journal of analytical chemistry 370, 654 (2001). http://doi.org/10.1007/s002160100880
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Photographic materials”. Verlinden G, Gijbels R, Geuens I Surface Spectra IM, Chichester, page 727 (2001).
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Analytical electron microscopy of silver halide photographic systems”. Oleshko VP, Gijbels RH, Jacob WA, Micron 31, 55 (2000). http://doi.org/10.1016/S0968-4328(99)00055-4
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Behavior of the sputtered copper atoms, ions and excited species in a radio-frequency and direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 55, 279 (2000). http://doi.org/10.1016/S0584-8547(00)00142-7
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Calculation of gas heating in direct current argon glow discharges”. Bogaerts A, Gijbels R, Serikov VV, Journal of applied physics 87, 8334 (2000). http://doi.org/10.1063/1.373545
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Chemical surface characterization of complex AgX microcrystals by imaging TOF-SIMS and dual beam depth profiling”. Verlinden G, Gijbels R, Geuens I, de Keyzer R, , 213 (2000)
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Comparison of calculated and measured optical emission intensities in a direct current argon-copper glow discharge”. Bogaerts A, Donko Z, Kutasi K, Bano G, Pinhao N, Pinheiro M, Spectrochimica acta: part B : atomic spectroscopy 55, 1465 (2000). http://doi.org/10.1016/S0584-8547(00)00253-6
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Description of the argon-excited levels in a radio-frequency and direct current glow discharge”. Bogaerts A, Gijbels R, Spectrochimica acta: part B : atomic spectroscopy 55, 263 (2000). http://doi.org/10.1016/S0584-8547(00)00143-9
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Determination of the silver sulphide cluster size distribution via computer simulations”. Charlier E, Gijbels R, Van Doorselaer M, De Keyzer R page 85 (2000).
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Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations”. Bogaerts A, Gijbels R, Journal of analytical atomic spectrometry 15, 441 (2000). http://doi.org/10.1039/a909779a
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Einleitung zu den massenspektrometrischen Methoden”. Gijbels R, Adriaens A Schweizerbart, Stuttgart, page 159 (2000).
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Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonance discharge”. Kaganovich I, Misina M, Berezhnoi S, Gijbels R, Physical review : E : statistical, nonlinear, and soft matter physics 61, 1875 (2000). http://doi.org/10.1103/PhysRevE.61.1875
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Electron energy distribution function in capacitively coupled RF discharges: differences between electropositive Ar and electronegative SiH4 discharges”. Yan M, Bogaerts A, Goedheer WJ, Gijbels R, Plasma sources science and technology 9, 583 (2000). http://doi.org/10.1088/0963-0252/9/4/314
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Electron microscopy and scanning microanalysis”. Oleshko V, Gijbels R, Amelinckx S Wiley, Chichester, page 9088 (2000).
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