List View
 |   | 
   web
Author Title Year (down) Publication Volume Times cited Additional Links
Tinck, S.; Tillocher, T.; Dussart, R.; Bogaerts, A. Cryogenic etching of silicon with SF6 inductively coupled plasmas: a combined modelling and experimental study 2015 Journal of physics: D: applied physics 48 9 UA library record; WoS full record; WoS citing articles