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Author Barreca, D.; Gasparotto, A.; Maccato, C.; Tondello, E.; Lebedev, O.I.; Van Tendeloo, G.
Title CVD of copper oxides from a \beta-diketonate diamine precursor: tailoring the nano-organization Type A1 Journal article
Year (down) 2009 Publication Crystal growth & design Abbreviated Journal Cryst Growth Des
Volume 9 Issue 5 Pages 2470-2480
Keywords A1 Journal article; Electron microscopy for materials research (EMAT)
Abstract A copper(II) hexafluoroacetylacetonate (1,1,1,5,5,5-hexafluoro-2,4-pentanedionate, hfa) adduct with N,N,N¡ä,N¡ä-tetramethylethylenediamine (TMEDA) [Cu(hfa)2¡¤TMEDA] is used for the first time as precursor for the chemical vapor deposition (CVD) of copper oxide nanosystems. The syntheses are carried out under both O2 and O2+H2O reaction atmospheres on Si(100) substrates, at temperatures ranging between 250 and 550 ¡ãC. Subsequently, the interrelations between the preparative conditions and the system composition, nanostructure, and morphology are elucidated by means of complementary analytical techniques [Fourier transform infrared spectroscopy (FT-IR), X-ray photoelectron and X-ray excited auger electron spectroscopies (XPS and XE-AES), glancing incidence X-ray diffraction (GIXRD), field emission scanning electron microscopy (FESEM), transmission electron microscopy (TEM)]. The obtained data revealed a gradual transformation from Cu2O, to Cu2O + CuO, to CuO nanosystems upon increasing the deposition temperature from 250 to 550 ¡ãC under both growth atmospheres. Such a phenomenon was accompanied by a progressive morphological evolution from continuous films to 1D hyperbranched nanostructures. Water vapor introduction in the deposition environment enabled to lower the deposition temperature and resulted in a higher aggregate interconnection, attributed to a higher density of nucleation centers.
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Publisher Place of Publication Editor
Language Wos 000265892200066 Publication Date 2009-05-06
Series Editor Series Title Abbreviated Series Title
Series Volume Series Issue Edition
ISSN 1528-7483;1528-7505; ISBN Additional Links UA library record; WoS full record; WoS citing articles
Impact Factor 4.055 Times cited 60 Open Access
Notes Esteem 026019 Approved Most recent IF: 4.055; 2009 IF: 4.162
Call Number UA @ lucian @ c:irua:77053 Serial 597
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