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High resolution TEM study of Ni4Ti3 precipitates in austenitic Ni51Ti49”. Tirry W, Schryvers D, Materials science and engineering: part A: structural materials: properties, microstructure and processing 378, 157 (2004). http://doi.org/10.1016/j.msea.2003.10.336
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Structure of multi-grain spherical particles in an amorphous Ti50Ni25Cu25 melt-spun ribbon”. Santamarta R, Schryvers D, Materials science and engineering: part A: structural materials: properties, microstructure and processing 378, 143 (2004). http://doi.org/10.1016/j.msea.2003.11.060
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Applications of advanced transmission electron microscopic techniques to Ni-Ti based shape memory materials”. Schryvers D, Potapov P, Santamarta R, Tirry W, Materials science and engineering: part A: structural materials: properties, microstructure and processing 378, 11 (2004). http://doi.org/10.1016/j.msea.2003.10.325
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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering”. Depla D, Chen ZY, Bogaerts A, Ignatova V, de Gryse R, Gijbels R, Journal of vacuum science and technology: A: vacuum surfaces and films 22, 1524 (2004). http://doi.org/10.1116/1.1705641
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Comparison of As- and P-based metamorphic buffers for high performance InP heterojunction bipolar transistor and high electron mobility transistor applications”. Lubyshev D, Fastenau JM, Fang X-M, Wu Y, Doss C, Snyder A, Liu WK, Lamb MSM, Bals S, Song C, Journal of vacuum science &, technology. B. Microelectronics and nanometer structures. Processing, measurement and phenomena 22, 1565 (2004). http://doi.org/10.1116/1.1691412
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High precision determination of the elastic strain of InGaN/GaN multiple quantum wells”. Wu MF, Zhou S, Yao S, Zhao Q, Vantomme A, van Daele B, Piscopiello E, Van Tendeloo G, Tong YZ, Yang ZJ, Yu TJ, Zhang GY, Journal of vacuum science and technology: B: microelectronics and nanometer structures 22, 920 (2004). http://doi.org/10.1116/1.1715085
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Depth profiling of ZrO2/SiO2/Si stacks : a TOF-SIMS and computer simulation study”. Ignatova VA, Conard T, Möller W, Vandervorst W, Gijbels R, Applied surface science 231/232, 603 (2004). http://doi.org/10.1016/j.apsusc.2004.03.121
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A comparative study of carbocyanine dyes measured with TOF-SIMS and other mass spectrometric techniques”. Adriaensen L, Vangaever F, Gijbels R, Applied surface science 231/232, 348 (2004). http://doi.org/10.1016/j.apsusc.2004.03.091
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Organic SIMS: the influence of time on the ion yield enhancement by silver and gold deposition”. Adriaensen L, Vangaever F, Gijbels R, Applied surface science 231/232, 256 (2004). http://doi.org/10.1016/j.apsusc.2004.03.031
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Investigation of growth mechanisms of clusters in a silane discharge with the use of a fluid model”. de Bleecker K, Bogaerts A, Goedheer W, Gijbels R, IEEE transactions on plasma science 32, 691 (2004). http://doi.org/10.1109/TPS.2004.826095
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Magnetic field dependence of the normal mode spectrum of a planar complex plasma cluster”. Kong M, Ferreira WP, Partoens B, Peeters FM, IEEE transactions on plasma science 32, 569 (2004). http://doi.org/10.1109/TPS.2004.826084
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A TEM study of nanoparticles in lustre glazes”. Fredrickx P, Helary D, Schryvers D, Darque-Ceretti E, Applied physics A : materials science &, processing 79, 283 (2004). http://doi.org/10.1007/s00339-004-2515-3
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Structure and microstructure of nanoscale mesoporous silica spheres”. Lebedev OI, Van Tendeloo G, Collart O, Cool P, Vansant EF, Solid state sciences 6, 489 (2004). http://doi.org/10.1016/j.solidstatesciences.2004.01.013
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Ferroelectric phase transition in the whitlockite-type Ca9Fe(PO4)7, crystal structure of the paraelectric phase at 923 K”. Lazoryak BI, Morozov VA, Belik AA, Stefanovich SY, Grebenev VV, Leonidov IA, Mitberg EB, Davydov SA, Lebedev OI, Van Tendeloo G, Solid state sciences 6, 185 (2004). http://doi.org/10.1016/j.solidstatesciences.2003.12.007
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Platinum group elements in the environment and their health risk”. Ravindra K, Bencs L, Van Grieken R, The science of the total environment 318, 1 (2004). http://doi.org/10.1016/S0048-9697(03)00372-3
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Elemental and ionic concentrations in the urban aerosol in Antwerp, Belgium”. Deutsch F, Stranger M, Kaplinskii AE, Samek L, Joos P, Van Grieken R, Journal of environmental science and health: part A: toxic/hazardous substances &, environmental engineering 39, 539 (2004). http://doi.org/10.1081/ESE-120027724
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Synthesis and structural investigations on the new Sr1.32Mn0.83Cu0.17O3 compound”. Abakumov AM, Mironov AV, Govorov VA, Lobanov MV, Rozova MG, Antipov EV, Lebedev OI, Van Tendeloo G, Solid state sciences 5, 1117 (2003). http://doi.org/10.1016/S1293-2558(03)00141-9
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A one-dimensional fluid model for an acetylene rf discharge: a study of the plasma chemistry”. Herrebout D, Bogaerts A, Gijbels R, Goedheer WJ, Vanhulsel A, IEEE transactions on plasma science 31, 659 (2003). http://doi.org/10.1109/TPS.2003.815249
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Synthesis and structure of Sr2MnGaO5+\delta brownmillerites with variable oxygen content”. Abakumov AM, Rozova MG, Alekseeva AM, Kovba ML, Antipov EV, Lebedev OI, Van Tendeloo G, Solid state sciences 5, 871 (2003). http://doi.org/10.1016/S1293-2558(03)00112-2
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Order and twining in Sb2W0.75Mo0.25O6”. Enjalbert R, Galy J, Castro A, Lidin S, Withers R, Van Tendeloo G, Solid state sciences 5, 721 (2003). http://doi.org/10.1016/S1293-2558(03)00093-1
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Imaging TOF-SIMS for the surface analysis of silver halide microcrystals”. Lenaerts J, Gijbels R, van Vaeck L, Verlinden G, Geuens I, Applied surface science 203/204, 614 (2003). http://doi.org/10.1016/S0169-4332(02)00777-8
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Ion-bombardment artifact in TOF-SIMS analysis of ZrO2/SiO2/Si stacks”. de Witte H, Conard T, Vandervorst W, Gijbels R, Applied surface science 203, 523 (2003). http://doi.org/10.1016/S0169-4332(02)00728-6
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Single-particle characterization of urban aerosol particles collected in three Korean cities using low-Z electron probe x-ray microanalysis”. Ro C-U, Kim H, Oh K-Y, Yea SK, Lee CB, Jang M, Van Grieken R, Environmental science and technology 36, 4770 (2002). http://doi.org/10.1021/ES025697Y
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Evolution of charged particle densities after laser-induced photodetachment in a strongly electronegative RF discharge”. Yan M, Bogaerts A, Gijbels R, IEEE transactions on plasma science 30, 132 (2002). http://doi.org/10.1109/TPS.2002.1003959
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Airborne particles in the Miyagi Museum of Art in Sendai, Japan, studied by electron probe X-ray microanalysis and energy dispersive X-ray fluorescence analysis”. Injuk J, Osán J, Van Grieken R, Tsuji K, Analytical sciences : the international journal of the Japan Society for Analytical Chemistry 18, 561 (2002). http://doi.org/10.2116/ANALSCI.18.561
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The ion- and atom-induced secondary electron emission yield: numerical study for the effect of clean and dirty cathode surfaces”. Bogaerts A, Gijbels R, Plasma sources science and technology 11, 27 (2002). http://doi.org/10.1088/0963-0252/11/1/303
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Synthesis and investigation of novel Mn-based oxyfluoride Sr2Mn2O5-xF1+x”. Lobanov MV, Abakumov AM, Sidorova AV, Rozova MG, D'yachenko OG, Antipov EV, Hadermann J, Van Tendeloo G, Solid state sciences 4, 19 (2002). http://doi.org/10.1016/S1293-2558(01)01209-2
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Catalyst traces and other impurities in chemically purified carbon nanotubes grown by CVD”. Biró, LP, Khanh NQ, Vértesy Z, Horváth ZE, Osváth Z, Koós A, Gyulai J, Kocsonya A, Kónya Z, Zhang XB, Van Tendeloo G, Fonseca A, Nagy JB;, Materials science and engineering: part C: biomimetic materials T2 –, EMRS Spring Meeting, JUN 05-08, 2001, STRASBOURG, FRANCE 19, 9 (2002). http://doi.org/10.1016/S0928-4931(01)00407-6
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Single-particle analysis of aerosols at Cheju Island, Korea, using low-Z electron probe X-ray microanalysis: a direct proof of nitrate formation from sea salts”. Ro C-U, Oh K-Y, Kim H, Kim YP, Lee CB, Kim K-H, Kang CH, Osán J, de Hoog J, Worobiec A, Van Grieken R, Environmental science and technology 35, 4487 (2001). http://doi.org/10.1021/ES0155231
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The use of convergent beam electron diffraction for stress measurements in shallow trench isolation structures”. Stuer C, van Landuyt J, Bender H, Rooyackers R, Badenes G, Materials science in semiconductor processing 4, 117 (2001). http://doi.org/10.1016/S1369-8001(00)00110-4
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